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BCl₃/Ar 플라즈마에 Cl₂ 가스 첨가에 따른 TiN 박막의 식각 특성

엄두승; 우종창; 김동표; 김창일

ArticleIssue Date2008Citation전기전자재료학회논문지, v.21, no.12, pp 1051 - 1056Publisher한국전기전자재료학회
Ar/CF4 유도결합 플라즈마에서 식각된 (Ba0.6Sr0.4)TiO3 박막의 손상 감소

강필승; 김경태; 김동표; 김창일

ArticleIssue Date2003Citation전기전자재료학회논문지, v.16, no.6Publisher한국전기전자재료학회
Study on the etch characteristics of BST thin films by using inductively coupled plasma

Kim, G.H.; Kim, K.T.; Kim, D.P.; Kim, C.I.; Park, C.S.; Kwon, K.H.

ArticleIssue Date2004CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.SUPPL., pp S724 - S727PublisherKOREAN PHYSICAL SOC
Temperature Dependence on Dry Etching of Hafnium Oxide Using an Inductively Coupled Plasma

Joo, Young-Hee; Woo, Jong-Chang; Yang, Xue; Kim, Chang-Il

ArticleIssue Date2010CitationFERROELECTRICS, v.406, no.1, pp 176 - 184PublisherTAYLOR & FRANCIS LTD
Cl-based 플라즈마에 의한 YMnO3 박막의 식각 damage에 관한 연구

박재화; 김경태; 김동표; 김창일; 장의구

ArticleIssue Date2003Citation전기전자재료학회논문지, v.16, no.6Publisher한국전기전자재료학회
BCl₃/Cl₂/Ar 플라즈마에서의 Na0.5K0.5NbO3 박막의 표면반응

김동표; 엄두승; 김관하; 우종창; 김창일

ArticleIssue Date2008Citation한국표면공학회지, v.41, no.6, pp 269 - 273Publisher한국표면공학회
Dry Etching of BST using Inductively Coupled Plasma

Gwan-Ha Kim; 김경태; 김동표; 김창일

ArticleIssue Date2005CitationTransactions on Electrical and Electronic Materials, v.6, no.2, pp 46 - 50Publisher한국전기전자재료학회
Effect of CF4 addition to Cl-2/Ar on the etching of ferroelectric YMnO3

Park, JH; Kim, KT; Kim, CI; Chang, EG

ArticleIssue Date2002CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.6, pp 993 - 997PublisherKOREAN PHYSICAL SOC
The etching properties of SBT thin films in BCl3/Cl-2/Ar plasma

Kim, D.P.; Yeo, J.W.; Kim, C.I.

ArticleIssue Date2004CitationTHIN SOLID FILMS, v.459, no.1-2, pp 76 - 81PublisherELSEVIER SCIENCE SA
He/BCl₃/Cl₂유도결합 플라즈마를 이용한 TiN 박막의 식각 특성

우종창; 주영희; 박정수; 김창일

ArticleIssue Date2011Citation전기전자재료학회논문지, v.24, no.9, pp 718 - 722Publisher한국전기전자재료학회
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