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Study on the etch characteristics of BST thin films by using inductively coupled plasma

Kim, G.H.; Kim, K.T.; Kim, D.P.; Kim, C.I.; Park, C.S.; Kwon, K.H.

ArticleIssue Date2004CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.SUPPL., pp S724 - S727PublisherKOREAN PHYSICAL SOC

Suppression of corrosion phenomenon on Al-1 %Cu surface with fluorine treatment

Kim, S.G.; Baek, K.H.; Kim, J.; Koo, J.G.; Kim, D.Y.; Kim, I.S.; Kwon, K.H.; Kim, C.I.

ArticleIssue Date1999CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.35, no.SUPPL. 2, pp S357 - S360PublisherKOREAN PHYSICAL SOC

Angle-resolved XPS investigation of the fluorine-related passivation layer on etched Al (Cu 1%) surface after SF6 treatment

Yoon, Y.S.; Baek, K.H.; Park, J.M.; Kwon, K.H.; Kim, C.I.; Hwang, I.G.

ArticleIssue Date1999CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.34, no.SUPPL. 3, pp S305 - S309PublisherKOREAN PHYSICAL SOC

Characteristics of LaNiO3 thin films fabricated by a simple metalorganic decomposition technique

Kim, K.T.; Song, S.H.; Kim, C.I.

ArticleIssue Date2004CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.SUPPL., pp S783 - S786PublisherKOREAN PHYSICAL SOC

Schematics and simulations of a nanotube shuttle nonvolatile memory device

Kang, Jeong Won; Lee, Jun Ha; Hwang, Ho Jung

ArticleIssue Date2007CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.50, no.3, pp 733 - 738PublisherKOREAN PHYSICAL SOC

Effect of CF4 addition to Cl-2/Ar on the etching of ferroelectric YMnO3

Park, JH; Kim, KT; Kim, CI; Chang, EG

ArticleIssue Date2002CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.6, pp 993 - 997PublisherKOREAN PHYSICAL SOC

Investigations on monitoring method for antimony implantation beam tuning

Kim, NH; Lee, DW; Chang, EG; Kim, SY; Kim, TH

ArticleIssue Date2004CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.SUPPL., pp S829 - S832PublisherKOREAN PHYSICAL SOC

Dielectric properties of (Pb,Sr)TiO3 thin films prepared by using the sol-gel method

Kim, KT; Kim, CI; Lee, SG

ArticleIssue Date2002CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.3, pp 377 - 380PublisherKOREAN PHYSICAL SOC

Optical emission spectroscopy analysis on the chemical reaction in etching of SrBi2Ta2O9 (SBT) thin films using inductively coupled Cl-2/Ar plasma

Kim, CI; Kim, DP; Shin, SU; Sim, KB; Chang, EG

ArticleIssue Date2001CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.39, no.SUPPL. Part 1, pp S219 - S223PublisherKOREAN PHYSICAL SOC

Etching properties of SrBi2Ta2O9 thin films using CF4/Ar magnetically enhanced inductively coupled plasmas for FRAM

Kim, DP; Kim, CI

ArticleIssue Date2001CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.39, no.1, pp 189 - 192PublisherKOREAN PHYSICAL SOC

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