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The etching characteristics of SrBi2Ta2O9 thin film in CF4/Ar plasma using magnetically enhanced inductively coupled plasma

Kim, DP; Kim, CI

ArticleIssue Date2001CitationTHIN SOLID FILMS, v.385, no.1-2, pp 162 - 166PublisherELSEVIER SCIENCE SA

Ar/CF4 유도결합 플라즈마에서 식각된 (Ba0.6Sr0.4)TiO3 박막의 손상 감소

강필승; 김경태; 김동표; 김창일

ArticleIssue Date2003Citation전기전자재료학회논문지, v.16, no.6Publisher한국전기전자재료학회

Temperature Dependence on Dry Etching of Hafnium Oxide Using an Inductively Coupled Plasma

Joo, Young-Hee; Woo, Jong-Chang; Yang, Xue; Kim, Chang-Il

ArticleIssue Date2010CitationFERROELECTRICS, v.406, no.1, pp 176 - 184PublisherTAYLOR & FRANCIS LTD

BCl₃/Cl₂/Ar 플라즈마에서의 Na0.5K0.5NbO3 박막의 표면반응

김동표; 엄두승; 김관하; 우종창; 김창일

ArticleIssue Date2008Citation한국표면공학회지, v.41, no.6, pp 269 - 273Publisher한국표면공학회

The etching properties of SBT thin films in BCl3/Cl-2/Ar plasma

Kim, D.P.; Yeo, J.W.; Kim, C.I.

ArticleIssue Date2004CitationTHIN SOLID FILMS, v.459, no.1-2, pp 76 - 81PublisherELSEVIER SCIENCE SA

Ar/CF4 유도결합 플라즈마를 이용한 (Ba0.6Sr0.4)TiO3 박막의 식각 특성

강필승; 김경태; 김동표; 김창일; 이수재

ArticleIssue Date2002Citation전기전자재료학회논문지, v.15, no.11Publisher한국전기전자재료학회

High-density plasma etching characteristics of aluminum-doped zinc oxide thin films in Cl-2/Ar plasma

Zhang, Liting; Joo, Young-Hee; Um, Doo-Seung; Kim, Chang-Il

ArticleIssue Date2020CitationMATERIALS RESEARCH EXPRESS, v.7, no.10PublisherIOP PUBLISHING LTD

Characteristics of CeO2 thin films etched with a high-density CF4/Ar plasma

Kim, DP; Kim, CI

ArticleIssue Date2002CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.4, pp 519 - 523PublisherKOREAN PHYSICAL SOC

CF4/Cl2/Ar 유도 결합 플라즈마에 의한 gold 박막의 식각특성

장윤성; 김동표; 김창일; 장의구

ArticleIssue Date2003Citation전기전자재료학회논문지, v.16, no.7Publisher한국전기전자재료학회

Reduction of dry etching damage to PZT films etched with a Cl-based plasma and the recovery behavior

Kang, M.G.; Kim, K.T.; Kim, D.P.; Kim, C.I.

ArticleIssue Date2002CitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.4, pp 445 - 450PublisherKOREAN PHYSICAL SOC

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