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Controlled Growth Saturation Behavior of Ultrathin Ru Film Using Electric Field/Potential Assisted Atomic Layer Deposition (EA-ALD)
- Authors
- 박태주
- Issue Date
- 27-Jan-2021
- Place
- 온라인
- Conference Name
- 제28회 한국반도체학술대회
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Related Researcher
- Park, Tae Joo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)