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Thermomechanical stability evaluation of various pellicle structures with contaminant particlesGo to Link

Ban, Chung-Hyun; Kang, In-Hwa; Choi, Won-Young; Oh, Hye-Keun

ArticleIssue Date2021CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.60, no.SCPublisherIOP PUBLISHING LTD
Optimization of meshed pellicle parameters for 16 nm node EUVL patterning

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ConferenceIssue Date2014CitationInternational Symposium on Extreme Ultraviolet lithographyPublisherSematechPlaceWashington D.C.
Feasibility test of 193 nm wavelength inspection for extreme ultraviolet mask

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ConferenceIssue Date2014CitationInternational Symposium on Extreme Ultraviolet lithographyPublisherSematechPlaceWashington D.C.
Extension of the mask lifetime and reduction of the line width variation by usinf the extreme ultraviolet pellicle

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ConferenceIssue Date2014CitationInternational symposium on Extreme Ultraviolet LithographyPublisherSematechPlaceWashington D.C.
Thermal stress analysis of the extreme ultraviolet multi-stack pellicle with high emissivity coating by finite element method

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ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
The impact of SRAFs between horizontal and vertical direction in anamorphic hifh NA lithogrpahy

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ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
The optimization of absorber thickness and absorber material for anamorphic NA system

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ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
SCOPUS
Wrinkle formation analysis in extreme-ultraviolet pellicleGo to Link

Jeong, H.-N.; Kim, G.-J.; Lee, S.-G.; Oh, H.-K.

ArticleIssue Date2017CitationProceedings of SPIE - The International Society for Optical Engineering, v.10450PublisherSPIE
The influence of damaged multi-stack pellicle during exposure process in terms of critical dimension error

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ConferenceIssue Date2016Citation2016 International Symposium on Extreme Ultraviolet LithographyPublisherEIDEC
SCOPUS
Search for multi-stack EUV pellicle membrane for EUV non-Actinic mask inspectionGo to Link

Lee, S.-G.; Kim, G.-J.; Hur, S.-M.; Oh, H.-K.

ArticleIssue Date2017CitationProceedings of SPIE - The International Society for Optical Engineering, v.10450PublisherSPIE
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