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Electrical Characteristics of Metal Catalyst-Assisted Etched Rough Silicon Nanowire Depending on the Diameter Size

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dc.contributor.authorLee, Sang Hoon-
dc.contributor.authorLee, Tae Il-
dc.contributor.authorLee, Su Jeong-
dc.contributor.authorLee, Sang Myung-
dc.contributor.authorYun, Ilgu-
dc.contributor.authorMyoung, Jae Min-
dc.date.available2020-02-28T10:44:05Z-
dc.date.created2020-02-06-
dc.date.issued2015-01-14-
dc.identifier.issn1944-8244-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/10869-
dc.description.abstractThe dependence of electrical properties of rough and cylindrical Si nanowires (NWs) synthesized by diameter-controllable metal catalyst-assisted etching (MCE) on the size of the NWs diameter was demonstrated. Using a decal-printing and transfer process assisted by Al2O3 sacrificial layer, the Si NW field effect transistor (FET) embedded in a polyvinylphenol adhesive and dielectric layer were fabricated. As the diameter of Si NW increased, the mobility of FET increased from 80.51 to 170.95 cm(2)/V.s and the threshold voltage moved from -7.17 to 0 V because phononelectron wave function overlaps, surface scattering, and defect scattering decreased and gate coupling increased as the ratio of surface-to-volume got reduced.-
dc.language영어-
dc.language.isoen-
dc.publisherAMER CHEMICAL SOC-
dc.relation.isPartOfACS APPLIED MATERIALS & INTERFACES-
dc.subjectFIELD-EFFECT TRANSISTORS-
dc.subjectSOLAR-CELLS-
dc.subjectGERMANIUM NANOWIRES-
dc.subjectCORE-SHELL-
dc.subjectGROWTH-
dc.subjectHETEROSTRUCTURES-
dc.subjectNANOSENSORS-
dc.subjectBIOSENSORS-
dc.titleElectrical Characteristics of Metal Catalyst-Assisted Etched Rough Silicon Nanowire Depending on the Diameter Size-
dc.typeArticle-
dc.type.rimsART-
dc.description.journalClass1-
dc.identifier.wosid000348085200111-
dc.identifier.doi10.1021/am507478q-
dc.identifier.bibliographicCitationACS APPLIED MATERIALS & INTERFACES, v.7, no.1, pp.929 - 934-
dc.identifier.scopusid2-s2.0-84921272592-
dc.citation.endPage934-
dc.citation.startPage929-
dc.citation.titleACS APPLIED MATERIALS & INTERFACES-
dc.citation.volume7-
dc.citation.number1-
dc.contributor.affiliatedAuthorLee, Tae Il-
dc.type.docTypeArticle-
dc.subject.keywordAuthordiameter modulation-
dc.subject.keywordAuthordielectrophorestic alignment-
dc.subject.keywordAuthorfield effect transistor-
dc.subject.keywordAuthorsilicon nanowires-
dc.subject.keywordAuthortransfer method-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusSOLAR-CELLS-
dc.subject.keywordPlusGERMANIUM NANOWIRES-
dc.subject.keywordPlusCORE-SHELL-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusHETEROSTRUCTURES-
dc.subject.keywordPlusNANOSENSORS-
dc.subject.keywordPlusBIOSENSORS-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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