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Working Pressure Dependence of WO3-x Thin Films Prepared by Reactive Facing Targets Sputtering
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Min Hong | - |
| dc.contributor.author | Bark, Chung Wung | - |
| dc.contributor.author | Choi, Hyung Wook | - |
| dc.contributor.author | Kim, Kyung Hwan | - |
| dc.date.available | 2020-02-28T15:46:19Z | - |
| dc.date.created | 2020-02-06 | - |
| dc.date.issued | 2014-10-13 | - |
| dc.identifier.issn | 1542-1406 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/12203 | - |
| dc.description.abstract | Tungsten oxide (WO3-x) thin films for an electrochromic (EC) device were deposited at an oxygen flow ratio [O-2/(Ar + O-2)] of 0.7 using reactive facing-target sputtering with a variable working pressure. The correlation between the WO3-x thin films and EC properties was investigated. The films structural properties were measured by X-ray diffraction; the indium tin oxide diffraction peak was observed in all the films. The electrochemical and optical properties were measured by cyclic voltammetry and UV/Vis spectrometry. The WO3-x thin film obtained at 0.13 Pa displayed a maximum coloration efficiency of 31.42cm(2)/C, which indicated superior EC properties. | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.publisher | TAYLOR & FRANCIS LTD | - |
| dc.relation.isPartOf | MOLECULAR CRYSTALS AND LIQUID CRYSTALS | - |
| dc.subject | TUNGSTEN-OXIDE FILMS | - |
| dc.subject | ELECTROCHROMIC PROPERTIES | - |
| dc.subject | COATINGS | - |
| dc.subject | DEVICES | - |
| dc.subject | OXYGEN | - |
| dc.title | Working Pressure Dependence of WO3-x Thin Films Prepared by Reactive Facing Targets Sputtering | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.wosid | 000345832700023 | - |
| dc.identifier.doi | 10.1080/15421406.2014.944761 | - |
| dc.identifier.bibliographicCitation | MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.602, no.1, pp.185 - 192 | - |
| dc.identifier.scopusid | 2-s2.0-84945200473 | - |
| dc.citation.endPage | 192 | - |
| dc.citation.startPage | 185 | - |
| dc.citation.title | MOLECULAR CRYSTALS AND LIQUID CRYSTALS | - |
| dc.citation.volume | 602 | - |
| dc.citation.number | 1 | - |
| dc.contributor.affiliatedAuthor | Kim, Min Hong | - |
| dc.contributor.affiliatedAuthor | Bark, Chung Wung | - |
| dc.contributor.affiliatedAuthor | Choi, Hyung Wook | - |
| dc.contributor.affiliatedAuthor | Kim, Kyung Hwan | - |
| dc.type.docType | Article | - |
| dc.subject.keywordAuthor | oxygen flow ratio | - |
| dc.subject.keywordAuthor | reactive sputtering | - |
| dc.subject.keywordAuthor | facing-target sputtering | - |
| dc.subject.keywordAuthor | Tungsten oxide | - |
| dc.subject.keywordAuthor | electrochromic | - |
| dc.subject.keywordAuthor | working pressure | - |
| dc.subject.keywordPlus | TUNGSTEN-OXIDE FILMS | - |
| dc.subject.keywordPlus | ELECTROCHROMIC PROPERTIES | - |
| dc.subject.keywordPlus | COATINGS | - |
| dc.subject.keywordPlus | DEVICES | - |
| dc.subject.keywordPlus | OXYGEN | - |
| dc.relation.journalResearchArea | Chemistry | - |
| dc.relation.journalResearchArea | Crystallography | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Crystallography | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
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Related Researcher
- Choi, Hyung Wook
- College of IT Convergence (Department of Electrical Engineering)