Detailed Information

Cited 10 time in webofscience Cited 10 time in scopus
Metadata Downloads

Bias-stress effects in diF-TES-ADT field-effect transistors

Full metadata record
DC Field Value Language
dc.contributor.authorKim, Chang-Hyun-
dc.date.available2020-02-27T04:40:46Z-
dc.date.created2020-02-04-
dc.date.issued2019-03-
dc.identifier.issn0038-1101-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/1753-
dc.description.abstractA systematic analysis of the bias-stress effects in solution-processed organic field-effect transistors is reported. Difluoro 5,11-bis(triethylsilylethynyl) anthradithiophene, a high-performance molecular semiconductor, forms a charge-transport channel and is coupled with injection contacts made of Au, Ag, or Cu. The electrode metal is found to not only greatly affect the switching performances but also drive the response of transistors to the extended applications of gate voltage. The observations are put into the framework of contact-limited transistor model, which holistically assesses the material, geometry, and stress-related contributions.-
dc.language영어-
dc.language.isoen-
dc.publisherPERGAMON-ELSEVIER SCIENCE LTD-
dc.relation.isPartOfSOLID-STATE ELECTRONICS-
dc.subjectCONTACT RESISTANCE-
dc.subjectMODEL-
dc.titleBias-stress effects in diF-TES-ADT field-effect transistors-
dc.typeArticle-
dc.type.rimsART-
dc.description.journalClass1-
dc.identifier.wosid000456333800005-
dc.identifier.doi10.1016/j.sse.2018.12.014-
dc.identifier.bibliographicCitationSOLID-STATE ELECTRONICS, v.153, pp.23 - 26-
dc.identifier.scopusid2-s2.0-85058537987-
dc.citation.endPage26-
dc.citation.startPage23-
dc.citation.titleSOLID-STATE ELECTRONICS-
dc.citation.volume153-
dc.contributor.affiliatedAuthorKim, Chang-Hyun-
dc.type.docTypeArticle-
dc.subject.keywordAuthorOrganic field-effect transistors-
dc.subject.keywordAuthorDiF-TES-ADT-
dc.subject.keywordAuthorBias stress-
dc.subject.keywordAuthorContact resistance-
dc.subject.keywordAuthorDevice physics-
dc.subject.keywordPlusCONTACT RESISTANCE-
dc.subject.keywordPlusMODEL-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
Files in This Item
There are no files associated with this item.
Appears in
Collections
IT융합대학 > 전자공학과 > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Kim, Chang Hyun photo

Kim, Chang Hyun
College of IT Convergence (Major of Electronic Engineering)
Read more

Altmetrics

Total Views & Downloads

BROWSE