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RF 스퍼터 공정압력의 변화에 따른 TiO2 박막의 특성
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 최형욱 | - |
| dc.date.available | 2020-04-24T15:45:43Z | - |
| dc.date.issued | 2009-06-20 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/33586 | - |
| dc.title | RF 스퍼터 공정압력의 변화에 따른 TiO2 박막의 특성 | - |
| dc.title.alternative | The Characteristics of TiO2 thin films on Working pressure of RF Sputter | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2009년도 한국전기전자재료학회 하계학술대회 | - |
| dc.citation.conferencePlace | 대한민국 | - |
| dc.citation.conferencePlace | 창원켄벤션센터 | - |
| dc.citation.endPage | 219 | - |
| dc.citation.startPage | 218 | - |
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Collections - IT융합대학 > 전기공학과 > 2. Conference Papers
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Related Researcher
- Choi, Hyung Wook
- College of IT Convergence (Department of Electrical Engineering)