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초박막 Si oxynitride의 스트레스에 의한 계면 열화 메커니즘
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이은철 | - |
| dc.date.available | 2020-04-24T20:39:29Z | - |
| dc.date.issued | 2007-11-02 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/35878 | - |
| dc.title | 초박막 Si oxynitride의 스트레스에 의한 계면 열화 메커니즘 | - |
| dc.title.alternative | Mechanism for stress-induced interface degradations in ultrathin Si oxynitrides | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2007년도 한국전기전자재료학회 | - |
| dc.citation.conferencePlace | South Korea | - |
| dc.citation.conferencePlace | 충주대학교(충북 충주) | - |
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Collections - 바이오나노대학 > 나노물리학과 > 2. Conference Papers
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Related Researcher
- Lee, Eun Cheol
- BioNano Technology (Department of Physics)