Effect of Amorphous Si Underlayer to CoCrTa/Si Thin Film perpared by Facing Targets Sputtering System
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 최동진 | - |
dc.date.available | 2020-04-25T03:37:13Z | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/37890 | - |
dc.title | Effect of Amorphous Si Underlayer to CoCrTa/Si Thin Film perpared by Facing Targets Sputtering System | - |
dc.type | Conference | - |
dc.citation.conferenceName | ICEE2002 전기공학 국제학술대회(The International Conference on Electical Engineering) | - |
dc.citation.conferencePlace | South Korea | - |
dc.citation.endPage | 1225 | - |
dc.citation.startPage | 1222 | - |
dc.citation.title | International Conference on Electrical Engineering 2002 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
1342, Seongnam-daero, Sujeong-gu, Seongnam-si, Gyeonggi-do, Republic of Korea(13120)031-750-5114
COPYRIGHT 2020 Gachon University All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.