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Results 1-1 of 1 (Search time: 0.002 seconds).
Influence of the gas pressure in a Torr regime capacitively coupled plasma deposition reactor
Kim, Ho Jun
Article
Issue Date
2021
Citation
PLASMA SOURCES SCIENCE & TECHNOLOGY, v.30, no.6
Publisher
IOP PUBLISHING LTD
1
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Author
Kim, Ho-Jun
1
Subject
AMORPHOUS-SILICON
1
capacitively coupled plasmas
1
deposition uniformity
1
fluid simulation
1
gas pressure effects
1
GROWTH
1
hydrogenated amorphous silicon
1
KINETICS
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MODEL
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plasma enhanced chemical vapor de...
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Date Issued
2021
1
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Article
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English
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