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Results 1-4 of 4 (Search time: 0.013 seconds).
Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor
Kim, Ho Jun
; Yoon, Jung Hwan
Article
Issue Date
2021
Citation
COATINGS, v.11, no.8
Publisher
MDPI
Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor
Kim, Ho Jun
Article
Issue Date
2021
Citation
COATINGS, v.11, no.8
Publisher
MDPI
Importance of Dielectric Elements for Attaining Process Uniformity in Capacitively Coupled Plasma Deposition Reactors
Kim, Ho Jun
Article
Issue Date
2022
Citation
COATINGS, v.12, no.4
Publisher
MDPI
Influence of the gas pressure in a Torr regime capacitively coupled plasma deposition reactor
Kim, Ho Jun
Article
Issue Date
2021
Citation
PLASMA SOURCES SCIENCE & TECHNOLOGY, v.30, no.6
Publisher
IOP PUBLISHING LTD
1
Discover
Author
Kim, Ho-Jun
4
Yoon, Jung Hwan
1
Subject
hydrogenated amorphous silicon
4
SIMULATION
3
capacitively coupled plasma
2
computational fluid dynamics
2
FLOW
2
plasma enhanced chemical vapor de...
2
plasma-enhanced chemical vapor de...
2
showerhead electrode
2
A-SI-H
1
AMORPHOUS-SILICON
1
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Date Issued
2022
1
2021
3
Type
Article
4
Language
English
4
Journal
Coatings
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Plasma Sources Science and Techno...
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