Advanced PIC-MCC simulation for the investigation of step-ionization effect in intermediate-pressure capacitively coupled plasmas
DC Field | Value | Language |
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dc.contributor.author | Kim, Jin Seok | - |
dc.contributor.author | Hur, Min Young | - |
dc.contributor.author | Kim, Chang Ho | - |
dc.contributor.author | Kim, Ho Jun | - |
dc.contributor.author | Lee, Hae June | - |
dc.date.available | 2020-10-20T06:45:49Z | - |
dc.date.created | 2020-06-11 | - |
dc.date.issued | 2018-03 | - |
dc.identifier.issn | 0022-3727 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/78648 | - |
dc.description.abstract | A two-dimensional parallelized particle-in-cell simulation has been developed to simulate a capacitively coupled plasma reactor. The parallelization using graphics processing units is applied to resolve the heavy computational load. It is found that the step-ionization plays an important role in the intermediate gas pressure of a few Torr. Without the step-ionization, the average electron density decreases while the effective electron temperature increases with the increase of gas pressure at a fixed power. With the step-ionization, however, the average electron density increases while the effective electron temperature decreases with the increase of gas pressure. The cases with the step-ionization agree well with the tendency of experimental measurement. The electron energy distribution functions show that the population of electrons having intermediate energy from 4.2 to 12 eV is relaxed by the stepionization. Also, it was observed that the power consumption by the electrons is increasing with the increase of gas pressure by the step-ionization process, while the power consumption by the ions decreases with the increase of gas pressure. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.relation.isPartOf | JOURNAL OF PHYSICS D-APPLIED PHYSICS | - |
dc.title | Advanced PIC-MCC simulation for the investigation of step-ionization effect in intermediate-pressure capacitively coupled plasmas | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000425627000002 | - |
dc.identifier.doi | 10.1088/1361-6463/aaa941 | - |
dc.identifier.bibliographicCitation | JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.51, no.10 | - |
dc.description.isOpenAccess | N | - |
dc.citation.title | JOURNAL OF PHYSICS D-APPLIED PHYSICS | - |
dc.citation.volume | 51 | - |
dc.citation.number | 10 | - |
dc.contributor.affiliatedAuthor | Kim, Ho Jun | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | particle-in-cell simulation | - |
dc.subject.keywordAuthor | capacitively coupled plasmas | - |
dc.subject.keywordAuthor | step ionization | - |
dc.subject.keywordPlus | CELL/MONTE CARLO METHOD | - |
dc.subject.keywordPlus | IN-CELL SIMULATION | - |
dc.subject.keywordPlus | DC MAGNETRON DISCHARGE | - |
dc.subject.keywordPlus | MONTE-CARLO | - |
dc.subject.keywordPlus | PARTICLE SIMULATION | - |
dc.subject.keywordPlus | RF DISCHARGES | - |
dc.subject.keywordPlus | FREQUENCY | - |
dc.subject.keywordPlus | MODEL | - |
dc.subject.keywordPlus | ENERGY | - |
dc.subject.keywordPlus | ARGON | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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