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Advanced PIC-MCC simulation for the investigation of step-ionization effect in intermediate-pressure capacitively coupled plasmas

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dc.contributor.authorKim, Jin Seok-
dc.contributor.authorHur, Min Young-
dc.contributor.authorKim, Chang Ho-
dc.contributor.authorKim, Ho Jun-
dc.contributor.authorLee, Hae June-
dc.date.available2020-10-20T06:45:49Z-
dc.date.created2020-06-11-
dc.date.issued2018-03-
dc.identifier.issn0022-3727-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/78648-
dc.description.abstractA two-dimensional parallelized particle-in-cell simulation has been developed to simulate a capacitively coupled plasma reactor. The parallelization using graphics processing units is applied to resolve the heavy computational load. It is found that the step-ionization plays an important role in the intermediate gas pressure of a few Torr. Without the step-ionization, the average electron density decreases while the effective electron temperature increases with the increase of gas pressure at a fixed power. With the step-ionization, however, the average electron density increases while the effective electron temperature decreases with the increase of gas pressure. The cases with the step-ionization agree well with the tendency of experimental measurement. The electron energy distribution functions show that the population of electrons having intermediate energy from 4.2 to 12 eV is relaxed by the stepionization. Also, it was observed that the power consumption by the electrons is increasing with the increase of gas pressure by the step-ionization process, while the power consumption by the ions decreases with the increase of gas pressure.-
dc.language영어-
dc.language.isoen-
dc.publisherIOP PUBLISHING LTD-
dc.relation.isPartOfJOURNAL OF PHYSICS D-APPLIED PHYSICS-
dc.titleAdvanced PIC-MCC simulation for the investigation of step-ionization effect in intermediate-pressure capacitively coupled plasmas-
dc.typeArticle-
dc.type.rimsART-
dc.description.journalClass1-
dc.identifier.wosid000425627000002-
dc.identifier.doi10.1088/1361-6463/aaa941-
dc.identifier.bibliographicCitationJOURNAL OF PHYSICS D-APPLIED PHYSICS, v.51, no.10-
dc.description.isOpenAccessN-
dc.citation.titleJOURNAL OF PHYSICS D-APPLIED PHYSICS-
dc.citation.volume51-
dc.citation.number10-
dc.contributor.affiliatedAuthorKim, Ho Jun-
dc.type.docTypeArticle-
dc.subject.keywordAuthorparticle-in-cell simulation-
dc.subject.keywordAuthorcapacitively coupled plasmas-
dc.subject.keywordAuthorstep ionization-
dc.subject.keywordPlusCELL/MONTE CARLO METHOD-
dc.subject.keywordPlusIN-CELL SIMULATION-
dc.subject.keywordPlusDC MAGNETRON DISCHARGE-
dc.subject.keywordPlusMONTE-CARLO-
dc.subject.keywordPlusPARTICLE SIMULATION-
dc.subject.keywordPlusRF DISCHARGES-
dc.subject.keywordPlusFREQUENCY-
dc.subject.keywordPlusMODEL-
dc.subject.keywordPlusENERGY-
dc.subject.keywordPlusARGON-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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