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Approaching the Nernst Detection Limit in an Electrolyte-Gated Metal Oxide Transistor

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dc.contributor.authorLee, Seyeong-
dc.contributor.authorPark, Sungjun-
dc.contributor.authorKim, Chang-Hyun-
dc.contributor.authorYoon, Myung-Han-
dc.date.available2021-02-01T00:40:16Z-
dc.date.created2020-12-15-
dc.date.issued2021-01-
dc.identifier.issn0741-3106-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/79852-
dc.description.abstractIn this letter, we demonstrate direct high-sensitivity proton detection by novel electrolyte-gated thin-film transistors. Integrating a sol-gel derived oxide channel and liquid electrolytes, a current switching by a factor of 107 was achieved within a 0.5 V gate window. Manipulation of the ionic strength in the gating solution led to an impressively large electrostatic shift (48 mV/pH), outperforming reported devices and ultimately approaching the Nernst limit. By means of impedance spectroscopy and transient measurements, we identified spatial compression of ionic charges at the electrical double layers as the origin of sensitivity, with the response time being dominated by the ion-transport resistance. IEEE-
dc.language영어-
dc.language.isoen-
dc.publisherInstitute of Electrical and Electronics Engineers Inc.-
dc.relation.isPartOfIEEE Electron Device Letters-
dc.titleApproaching the Nernst Detection Limit in an Electrolyte-Gated Metal Oxide Transistor-
dc.typeArticle-
dc.type.rimsART-
dc.description.journalClass1-
dc.identifier.wosid000603486200012-
dc.identifier.doi10.1109/LED.2020.3040149-
dc.identifier.bibliographicCitationIEEE Electron Device Letters, v.42, no.1, pp.50 - 53-
dc.description.isOpenAccessN-
dc.identifier.scopusid2-s2.0-85097169253-
dc.citation.endPage53-
dc.citation.startPage50-
dc.citation.titleIEEE Electron Device Letters-
dc.citation.volume42-
dc.citation.number1-
dc.contributor.affiliatedAuthorKim, Chang-Hyun-
dc.type.docTypeArticle-
dc.subject.keywordAuthorelectrolyte-gated thin-film transistors-
dc.subject.keywordAuthorElectrolytes-
dc.subject.keywordAuthorImpedance-
dc.subject.keywordAuthorimpedance spectroscopy-
dc.subject.keywordAuthormetal oxide semiconductors-
dc.subject.keywordAuthorpH sensing-
dc.subject.keywordAuthorProtons-
dc.subject.keywordAuthorSemiconductor device measurement-
dc.subject.keywordAuthorSensors-
dc.subject.keywordAuthorSurface morphology-
dc.subject.keywordAuthorTransistors-
dc.subject.keywordPlusElectrostatic devices-
dc.subject.keywordPlusIonic strength-
dc.subject.keywordPlusMetals-
dc.subject.keywordPlusSol-gels-
dc.subject.keywordPlusThin film transistors-
dc.subject.keywordPlusCurrent switching-
dc.subject.keywordPlusElectrical double layers-
dc.subject.keywordPlusImpedance spectroscopy-
dc.subject.keywordPlusLiquid electrolytes-
dc.subject.keywordPlusNovel electrolytes-
dc.subject.keywordPlusProton detections-
dc.subject.keywordPlusSpatial compression-
dc.subject.keywordPlusTransient measurement-
dc.subject.keywordPlusElectrolytes-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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