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Importance of higher-level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways

Authors
Cheon, CheongbinYoon, Jung HwanJo, SanghyunKim, Ho JunLee, Hae June
Issue Date
Jun-2022
Publisher
WILEY-V C H VERLAG GMBH
Keywords
computational fluid dynamics; glow discharges; plasma chemistry; remote plasma processes; remote plasma source
Citation
PLASMA PROCESSES AND POLYMERS, v.19, no.6
Journal Title
PLASMA PROCESSES AND POLYMERS
Volume
19
Number
6
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/84552
DOI
10.1002/ppap.202100251
ISSN
1612-8850
Abstract
Stable plasma ignition of remote plasma sources (RPSs) for various plasma processes is essential to ensure the stability of the discharge, steady operating conditions, and high plasma density. In an RPS in which the gas pressure exceeds 1 Torr, the reaction paths leading to the high-level excited state play an essential role in the power balance and energy cascade at high applied input power. In this study, 97 chemical reactions in a detailed reaction set involving argon discharge are investigated in the steady-state to understand the extent to which the dominant reactions are affected by variations in the process parameters. We observed that the stepwise ionization process of the argon 4p excited state significantly contributes to sustaining high-density plasmas in the near 1 Torr regime.
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