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Significant Reduction of 1/f Noise in Organic Thin-Film Transistors With Self-Assembled Monolayer: Considerations of Density-of-States

Authors
Shin, WonjunBae, JisukPark, Joon HyungLee, Jong-HoKim, Chang-HyunLee, Sung-Tae
Issue Date
Apr-2024
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Keywords
Organic thin film transistors; Logic gates; Dielectrics; 1/f noise; Chemicals; Behavioral sciences; Wearable devices; Organic thin-film transistor (OTFT); low-frequency noise; density of states
Citation
IEEE ELECTRON DEVICE LETTERS, v.45, no.4, pp 704 - 707
Pages
4
Journal Title
IEEE ELECTRON DEVICE LETTERS
Volume
45
Number
4
Start Page
704
End Page
707
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/92107
DOI
10.1109/LED.2024.3368129
ISSN
0741-3106
1558-0563
Abstract
This study investigates the low-frequency noise characteristics of the p -type organic thin-film transistors (OTFTs) with dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene (DNTT) by considering density-of-states (DOS). The OTFTs are fabricated with and without a self-assembled monolayer (SAM) on the SiO2 gate dielectrics. A significant reduction of 1/ f is observed in the OTFTs with SAM compared to those without SAM. Moreover, this reduction is more pronounced in the high drain current region, indicating that the excess noise is reduced due to the lower DOS resulting from the introduction of SAM.
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