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Silicon Wafer CMP Slurry Using a Hydrolysis Reaction Accelerator with an Amine Functional Group Remarkably Enhances Polishing RateGo to Linkopen access

Bae, Jae-Young; Han, Man-Hyup; Lee, Seung-Jae; Kim, Eun-Seong; 이경식; Lee, Gon-Sub; Park, Jin-Hyung; Park, Jea-Gun

ArticleIssue Date2022CitationNANOMATERIALS, v.12, no.21, pp 1 - 13PublisherMDPI
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