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Radical-Induced Effect on PEALD SiO2 Films by Applying Positive DC BiasGo to Link

Park, Suhyeon; Park, Taehun; Choi, Yeongtae; 정찬원; Kim, Byunguk; Jeon, Hyeongtag

ArticleIssue Date2022CitationECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.11, no.2, pp 1 - 7PublisherELECTROCHEMICAL SOC INC
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