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Instability of incorporated nitrogen in HfO2 films grown on strained Si0.7Ge0.3 layersGo to Link

Chung, Ku Bong; Lucovsky, Gerald L.; Lee, Won-Jae; Cho, Man Ho; Jeon, Hyeongtag

ArticleIssue Date2009CitationApplied Physics Letters, v.94, no.4, pp 1 - 3PublisherAmerican Institute of Physics
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