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Multi-step ion beam etching of sub-30 nm magnetic tunnel junctions for reducing leakage and MgO barrier damageGo to Link

Chun, Sung-Woo; Kim, Daehong; Kwon, Jihun; Kim, Bongho; Choi, Seonjun; Lee, Seung-Beck

ArticleIssue Date2012CitationJournal of Applied Physics, v.111, no.7, pp 1 - 3PublisherAmerican Institute of Physics
SCISCIESCOPUS
Negative electron-beam resist hard mask ion beam etching process for the fabrication of nanoscale magnetic tunnel junctionsGo to Link

Chun, Sung-Woo; Kim, Daehong; Kwon, Jihun; Kim, Bongho; Lee, Hyungyu; Lee, Seung-Beck

ArticleIssue Date2012CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.30, no.6, pp 1 - 5PublisherAmerican Institute of Physics
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