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Sustained Area-Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O3 in Deposition and EtchingGo to Linkopen access

Kim, Han; Kim, Taeseok; Chung, Hong Keun; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Kim, Sangtae; Kim, Seong Keun

ArticleIssue Date2024CitationSmall, v.20, no.46, pp 1 - 8PublisherWiley - V C H Verlag GmbbH & Co.
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