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The annealing effect on work function variation of WNxCy films deposited by remote plasma atomic layer depositionGo to Link

Kim, Hyunjung; Jang, Woochool; Shin, Changhee; Lee, Kunyoung; Lim, Heewoo; Kim, Manseok; Yuh, Junhan; Jeon, Hyeongtag

ArticleIssue Date2017Citationphysica status solidi (a) - applications and materials science, v.214, no.7PublisherWiley - V C H Verlag GmbbH & Co.
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