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Highly-impermeable Al2O3/HfO2 moisture barrier films grown by low-temperature plasma-enhanced atomic layer depositionGo to Link

Kim, Lae Ho; Jang, Jin Hyuk; Jeong, Yong Jin; Kim, Kyunghun; Baek, Yonghwa; Kwon, Hyeok-jin; An, Tae Kyu; Nam, Sooji; Kim, Se Hyun; Jang, Jaeyoung, et al.

ArticleIssue Date2017CitationOrganic Electronics, v.50, pp 296 - 303PublisherElsevier BV
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