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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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SCIESCOPUS
Constraints on removal of Si3N4 film with conformation-controlled poly(acrylic acid) in shallow-trench isolation chemical-mechanical planarization (STI CMP)Go to Link

Kim, Ye-Hwan; Lee, Seung-Mi; Lee, Kee-June; Paik, Ungyu; Park, Jea-Gun

ArticleIssue Date2008CitationJournal of Materials Research, v.23, no.1, pp 49 - 54PublisherMaterials Research Society
SCIESCOPUS
High-Removal Selectivity Through Interaction Between Polyacrylamide and SiO2 Film in Poly Isolation Chemical Mechanical PlanarizationGo to Link

Kim, Ye-Hwan; Lee, Kee-June; Park, Jea-Gun; Paik, Ungyu

ArticleIssue Date2009CitationJournal of Nanoscience and Nanotechnology, v.9, no.6, pp 3780 - 3784PublisherAmerican Scientific Publishers
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