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Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer depositionGo to Link

Park, Taeyong; Lee, Jaesang; Park, Jingyu; Jeon, Heeyoung; Jeon, Hyeongtag; Lee, Ki-Hoon; Cho, Byung-Chul; Kim, Moo-Sung; Ahn, Heui-Bok

ArticleIssue Date2012CitationJournal of Vacuum Science and Technology A, v.30, no.1, pp 1 - 6PublisherAmerican Institute of Physics
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