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Characteristics of atomic-layer-deposited HfO2 films by using a remote plasma on pre-deposited Hf metal layerGo to Link

Hong, Hyungseok; Kim, Seokhoon; Woo, Sanghyun; Kim, Hyungchul; Kim, Honggyu; Jeong, Wooho; Jeon, Sunyeol; Bang, Seokhwan; Lfe, Seungjun; Jeon, Hyeongtag

ArticleIssue Date2008CitationJournal of the Korean Physical Society, v.52, no.4, pp 1114 - 1119Publisher한국물리학회
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