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Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applicationsGo to Link

Lee, Jaesang; Kim, Hyungchul; Park, Taeyong; Ko, Youngbin; Ryu, Jaehun; Jeon, Heeyoung; Park, Jingyu; Jeon, Hyeongtag

ArticleIssue Date2012CitationJournal of Vacuum Science and Technology A, v.30, no.1, pp 1 - 7PublisherAmerican Institute of Physics
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The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer DepositionGo to Link

Lee, Jaesang; Kim, Hyungchul; Park, Taeyong; Ko, Youngbin; Jeon, Heeyoung; Park, Jingyu; Ryu, Jaehun; Jeon, Hyeongtag

ArticleIssue Date2012CitationJournal of Nanoscience and Nanotechnology, v.12, no.7, pp 5494 - 5499PublisherAmerican Scientific Publishers
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