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Change in band alignment of HfO2 films with annealing treatmentsGo to Link

Yim, Chang-Joon; Ko, Dae Hong; Jang, Moon Hyung; Chung, Kwun Bum; Cho, Mann Ho; Jeon, Hyeongtag

ArticleIssue Date2008CitationApplied Physics Letters, v.92, no.1, pp 1 - 3PublisherAmerican Institute of Physics
SCIESCOPUS
Change in the interfacial reaction of Hf-silicate film as a function of thickness and stoichiometryGo to Link

Cho, Mann Ho; Kim, Chang Young; Moon, Kyeong-ju; Chung, Kwun Bum; Yim, Chang-Joon; Ko, Dae Hong; Sohn, Hyunchul Cheol; Jeon, Hyeongtag

ArticleIssue Date2008CitationThe Journal of Chemical Physics, v.129, no.3, pp 1 - 4PublisherAmerican Institute of Physics
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