<?xml version="1.0" encoding="UTF-8"?>
<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns="http://purl.org/rss/1.0/" xmlns:dc="http://purl.org/dc/elements/1.1/">
  <channel rdf:about="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/234">
    <title>ScholarWorks Collection:</title>
    <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/234</link>
    <description />
    <items>
      <rdf:Seq>
        <rdf:li rdf:resource="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213652" />
        <rdf:li rdf:resource="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213639" />
        <rdf:li rdf:resource="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213638" />
        <rdf:li rdf:resource="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213647" />
      </rdf:Seq>
    </items>
    <dc:date>2026-07-04T02:58:34Z</dc:date>
  </channel>
  <item rdf:about="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213652">
    <title>Vapor-Phase Dry Development Enabling High-Resolution and Improved CDU in EUV Photoresists</title>
    <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213652</link>
    <description>Title: Vapor-Phase Dry Development Enabling High-Resolution and Improved CDU in EUV Photoresists
Authors: 안진호</description>
    <dc:date>2026-02-25T00:00:00Z</dc:date>
  </item>
  <item rdf:about="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213639">
    <title>Reliable actinic mask evaluation via high-frequency signal enhancement in EUV ptychography</title>
    <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213639</link>
    <description>Title: Reliable actinic mask evaluation via high-frequency signal enhancement in EUV ptychography
Authors: 안진호</description>
    <dc:date>2026-02-25T00:00:00Z</dc:date>
  </item>
  <item rdf:about="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213638">
    <title>Resolution enhancement in EUV ptychography via optimized probe overlap ratio for diffraction diversity</title>
    <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213638</link>
    <description>Title: Resolution enhancement in EUV ptychography via optimized probe overlap ratio for diffraction diversity
Authors: 안진호</description>
    <dc:date>2026-02-25T00:00:00Z</dc:date>
  </item>
  <item rdf:about="https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213647">
    <title>Resolution Enhancement in EUV Ptychography via Optimized Probe Overlap Ratio for Diffraction Diversity</title>
    <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213647</link>
    <description>Title: Resolution Enhancement in EUV Ptychography via Optimized Probe Overlap Ratio for Diffraction Diversity
Authors: 안진호</description>
    <dc:date>2026-02-06T00:00:00Z</dc:date>
  </item>
</rdf:RDF>

