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    <title>ScholarWorks Community:</title>
    <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/160</link>
    <description />
    <pubDate>Fri, 24 Jul 2026 05:50:40 GMT</pubDate>
    <dc:date>2026-07-24T05:50:40Z</dc:date>
    <item>
      <title>Distributed DC voltage based grid forming control of interlinking converters in DC local grids</title>
      <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/212473</link>
      <description>Title: Distributed DC voltage based grid forming control of interlinking converters in DC local grids
Authors: Park, Su-Seong; Jung, Jin-Woo; Kim, Rae-Young; Lee, Dong-Geun
Abstract: This paper proposes a distributed DC-voltage-based grid-forming control strategy for bidirectional interlinking converters in DC local grids. The proposed method establishes GFM (grid-forming) capability through DC-voltage synchronization among converters and enables sensorless droop operation using AC active power feedback. Small-signal analysis reveals the synchronous oscillation mechanism, which is mitigated using a notch-filterbased stabilization method. Simulation results demonstrate that the proposed control effectively suppresses synchronous oscillation and improves dynamic performance compared with conventional droop-GFM and DVSCGFM methods under various scenarios including weak-grid and increased renewable penetration conditions.</description>
      <pubDate>Tue, 01 Sep 2026 00:00:00 GMT</pubDate>
      <guid isPermaLink="false">https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/212473</guid>
      <dc:date>2026-09-01T00:00:00Z</dc:date>
    </item>
    <item>
      <title>Selective radiation emitters consisting of black silicon and photonic crystal for thermophotovoltaic systems</title>
      <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213885</link>
      <description>Title: Selective radiation emitters consisting of black silicon and photonic crystal for thermophotovoltaic systems
Authors: Lee, Sung-Min
Abstract: Highly radiative, wavelength-selective emitters are investigated for efficient Thermophotovoltaic (TPV) systems by integrating black silicon with a high-temperature one-dimensional photonic crystal (1D PC). The black silicon featuring a randomly distributed nanocolumn surface serves as an ideal black body emitter with high emissivity, while the 1D PC composed of alternating metal and dielectric layers provides spectral radiation selectivity and hence effectively suppresses radiation loss. Experimental results for 1D PC-integrated black silicon, fabricated using a scalable and potentially cost-effective method, show a two-fold improvement in spectral cut-off efficiency compared to pure black silicon. The robust operation under high-temperature conditions demonstrates its potential as a feasible emitter. Details of the design process, fabrication strategy, and quantitative characterization suggest the promising potential of combining ideal black silicon emitters with spectrally manageable photonic technology to advance TPV systems.</description>
      <pubDate>Tue, 01 Sep 2026 00:00:00 GMT</pubDate>
      <guid isPermaLink="false">https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/213885</guid>
      <dc:date>2026-09-01T00:00:00Z</dc:date>
    </item>
    <item>
      <title>Noninvasive method for monitoring plasma parameters and dielectric thickness applicable to plasma processing</title>
      <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218607</link>
      <description>Title: Noninvasive method for monitoring plasma parameters and dielectric thickness applicable to plasma processing
Authors: Seo, Beom-Jun; Jung, Jiwon; Choi, Jae-Hoon; Ahn, Se-Hun; Kim, Nayeon; Chung, Chin-Wook
Abstract: Maintaining process uniformity is critical in high-aspect-ratio etching, where local plasma and surface conditions strongly influence etch performance. Among the hardware components affecting uniformity, the focus ring, a dielectric structure surrounding the wafer, plays a key role in shaping the edge plasma and maintaining uniform ion flux. However, its gradual erosion during operation causes nonuniform etch profiles, particle generation, and yield degradation, making real-time wear monitoring essential for stable, high-yield semiconductor processing. Here, we present an electrical sensing method for real-time, in situ monitoring of thick dielectric components under plasma operation. The plasma–dielectric system is modeled as an equivalent circuit, and dielectric thickness is extracted from capacitance using a dual-frequency method that decouples plasma effects. Fringing effects are incorporated into the ideal parallel-plate capacitor model using a Padé approximant, and the model is further refined by weighted least-squares fitting. The proposed method enables accurate thickness measurement despite plasma variations and provides a practical, noninvasive approach for monitoring both plasma parameters and focus ring wear during plasma processing.</description>
      <pubDate>Wed, 01 Jul 2026 00:00:00 GMT</pubDate>
      <guid isPermaLink="false">https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218607</guid>
      <dc:date>2026-07-01T00:00:00Z</dc:date>
    </item>
    <item>
      <title>Output-feedback Adaptive-RL based Backstepping Control with Levenberg-Marquardt Parameter Identification for PMSMs</title>
      <link>https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218790</link>
      <description>Title: Output-feedback Adaptive-RL based Backstepping Control with Levenberg-Marquardt Parameter Identification for PMSMs
Authors: 문준</description>
      <pubDate>Wed, 17 Jun 2026 00:00:00 GMT</pubDate>
      <guid isPermaLink="false">https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/218790</guid>
      <dc:date>2026-06-17T00:00:00Z</dc:date>
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