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Plasma dry etching resistant glass (PRG) for preventing degradation and particulate contamination in semiconductor process: A review
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 임원빈 | - |
| dc.date.accessioned | 2021-11-30T05:40:49Z | - |
| dc.date.available | 2021-11-30T05:40:49Z | - |
| dc.date.issued | 2021-11-04 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/133412 | - |
| dc.title | Plasma dry etching resistant glass (PRG) for preventing degradation and particulate contamination in semiconductor process: A review | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2021년 한국세라믹학회 추계학술대회 | - |
| dc.citation.conferencePlace | 제주 라마다호텔/오리엔탈 호텔(온라인 동시 개최) | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Im, Won Bin
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)