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Remote plasma atomic layer deposition of SiNx gate spacer using BDEAS and N2 plasma

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dc.contributor.author전형탁-
dc.date.accessioned2022-02-03T01:56:35Z-
dc.date.available2022-02-03T01:56:35Z-
dc.date.issued20211118-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/134236-
dc.titleRemote plasma atomic layer deposition of SiNx gate spacer using BDEAS and N2 plasma-
dc.typeConference-
dc.citation.conferenceName2021년 추계학술대회-
dc.citation.conferencePlace용인문화예술원-
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COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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