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Characteristics of ALD Silicon Nitride Thin Film with Plasma Treatment
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2022-03-24T09:06:08Z | - |
| dc.date.available | 2022-03-24T09:06:08Z | - |
| dc.date.issued | 20210422 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/135765 | - |
| dc.title | Characteristics of ALD Silicon Nitride Thin Film with Plasma Treatment | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2021 virtual MRS spring meeting & exhibit | - |
| dc.citation.conferencePlace | 온라인 진행 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)