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Interface Trap Suppression and Electron Doping in Van der Waals Materials Using Cross-Linked Poly(vinylpyrrolidone)

Authors
Lee, JuchanBang, SeunghoPark, Hyeon JungPark, Dae YoungPark, ChulhoDuong, Ngoc ThanhWon, Yo SeobJang, JiseongOh, Hye MinChoi, Soo HoKim, Ki KangJeong, Mun Seok
Issue Date
Nov-2021
Publisher
AMER CHEMICAL SOC
Keywords
transition-metal dichalcogenides; poly(vinylpyrrolidone); n-doping; interface trap; electron doping
Citation
ACS APPLIED MATERIALS & INTERFACES, v.13, no.46, pp.55489 - 55497
Indexed
SCIE
SCOPUS
Journal Title
ACS APPLIED MATERIALS & INTERFACES
Volume
13
Number
46
Start Page
55489
End Page
55497
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/140428
DOI
10.1021/acsami.1c12968
ISSN
1944-8244
Abstract
The instability of van der Waals (vdW) materials leads to spontaneous morphological and chemical transformations in the air. Although the passivation of vdW materials with other resistive materials is often used to solve stability issues, this passivation layer can block carrier injection and thus interfere with charge transfer doping. In this study, a facile method is proposed for n-doping and mediation of Se vacancies in tungsten diselenide (WSe2) by poly(vinylpyrrolidone) (PVP) coating. The major carrier type of the PVP-coated WSe2-based field-effect transistor (FET) was converted from hole (p-type) to electron (n-type). Furthermore, the vacancy-induced interface trap density was reduced by approximately 500 times. This study provides a practical doping and passivation method for the van der Waals materials, as well as a comprehensive understanding of the chemical reaction and electronic transport in these materials.
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