MgO-Al2O3-SiO2계 유리의 열물성과 내플라즈마성 연구

Abstract

In this study, we studied the alternative of plasma resistant ceramic parts that constitute plasma chambers in the semiconductor dry etching process. MgO-Al2O3-SiO2(MAS) glass was made of 13 types of glass using the Design Of Experiments(DOE) and the effect on thermal properties such as glass transition temperature and crystallization temperature depending on the content of each composition and etching resistance to CF4/O2/Ar plasma gas. MAS glass showed excellent plasma resistance and surface roughness up to 20 times higher than quartz glass. As the content of Al2O3 and MgO increases, the plasma resistance is improved, and it has been confirmed that it has an inverse relationship with SiO2.