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Distribution-guided heuristic search for nonlinear parameter estimation with an application in semiconductor manufacturing

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dc.contributor.authorKim, Hyungjin-
dc.contributor.authorPark, Chuljin-
dc.contributor.authorKang, Yoonshik-
dc.date.accessioned2022-07-07T11:12:40Z-
dc.date.available2022-07-07T11:12:40Z-
dc.date.created2021-05-12-
dc.date.issued2020-11-
dc.identifier.issn2472-5854-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/144386-
dc.description.abstractEstimating a batch of parameter vectors of a nonlinear model is considered, where there exists a model interpreting the independent and the dependent variables, and the parameter vectors of the model are assumed to be sampled from a multivariate normal distribution. The mean vector and the covariance matrix of the parameter distribution can be assumed and such a parameter distribution is referred to as the hypothetical underlying distribution. A new framework is proposed, namely, the distribution-guided heuristic search framework, which uses the information of the hypothetical underlying distribution with the following two main concepts: (i) changing the coordinate of the parameter vectors via linear transformation and (ii) probabilistically filtering a parameter vector sampled by a heuristic algorithm. The framework is not a stand-alone algorithm, but it works with any heuristic algorithms to solve the target problem. The framework was tested in two simulation studies and was applied to a real example of measuring the critical dimensions of a 2-dimensional high-aspect-ratio structure of a wafer in semiconductor manufacturing. The test results show that a heuristic algorithm within the proposed framework outperforms the original heuristic algorithm as well as other existing algorithms.-
dc.language영어-
dc.language.isoen-
dc.publisherTAYLOR & FRANCIS INC-
dc.titleDistribution-guided heuristic search for nonlinear parameter estimation with an application in semiconductor manufacturing-
dc.typeArticle-
dc.contributor.affiliatedAuthorPark, Chuljin-
dc.identifier.doi10.1080/24725854.2019.1709135-
dc.identifier.scopusid2-s2.0-85079217684-
dc.identifier.wosid000515265400001-
dc.identifier.bibliographicCitationIISE TRANSACTIONS, v.52, no.11, pp.1246 - 1261-
dc.relation.isPartOfIISE TRANSACTIONS-
dc.citation.titleIISE TRANSACTIONS-
dc.citation.volume52-
dc.citation.number11-
dc.citation.startPage1246-
dc.citation.endPage1261-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaOperations Research & Management Science-
dc.relation.journalWebOfScienceCategoryEngineering, Industrial-
dc.relation.journalWebOfScienceCategoryOperations Research & Management Science-
dc.subject.keywordPlusGENETIC ALGORITHM-
dc.subject.keywordPlusELECTROMAGNETIC INDUCTION-
dc.subject.keywordPlusOPTIMIZATION-
dc.subject.keywordPlusSYSTEMS-
dc.subject.keywordPlusMODELS-
dc.subject.keywordAuthorNonlinear parameter estimation-
dc.subject.keywordAuthorinverse problem-
dc.subject.keywordAuthorheuristic search-
dc.subject.keywordAuthoroptical critical dimension-
dc.subject.keywordAuthorsemiconductor manufacturing-
dc.identifier.urlhttps://www.tandfonline.com/doi/full/10.1080/24725854.2019.1709135-
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