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Field emission properties of a three-dimensional network of single-walled carbon nanotubes inside pores of porous silicon

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dc.contributor.authorLee, Jungwoo-
dc.contributor.authorPark, Taehee-
dc.contributor.authorLee, Jongtaek-
dc.contributor.authorKim, Heesu-
dc.contributor.authorLee, Sanghun-
dc.contributor.authorLee, Haiwon-
dc.contributor.authorYi, Whikun-
dc.date.accessioned2022-07-07T13:45:14Z-
dc.date.available2022-07-07T13:45:14Z-
dc.date.created2021-05-11-
dc.date.issued2012-10-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/144713-
dc.description.abstractThis paper reports the characteristic field emission (FE) properties of single-walled carbon nanotubes (SWNTs) synthesized on the inside pores of a porous silicon (PS) substrate, as well as on the top surface of a PS substrate. Their turn-on fields and emission current densities are measured and compared with those of other types of SWNTs in similar environments. Investigation of field emission properties of single-walled carbon nanotubes (SWNTs) synthesized on the inside pores of a porous silicon (PS) substrate reveals a low turn-on field of about 2.25 V μm-1 at 10 μA/cm2 and a high field-enhancement factor (6182) compare with other samples. A life time stability test is performed by monitoring the current density change before and after repeated exposure to O2, suggesting that the pore channel can effectively prevent O2+ ion etching from destroying the SWNTs within the pores of the PS layer.-
dc.language영어-
dc.language.isoen-
dc.publisherIEEE Computer Society-
dc.titleField emission properties of a three-dimensional network of single-walled carbon nanotubes inside pores of porous silicon-
dc.typeArticle-
dc.contributor.affiliatedAuthorYi, Whikun-
dc.identifier.doi10.1109/IVNC.2012.6316970-
dc.identifier.scopusid2-s2.0-84869059485-
dc.identifier.bibliographicCitationTechnical Digest - 25th International Vacuum Nanoelectronics Conference, IVNC 2012, pp.362 - 363-
dc.relation.isPartOfTechnical Digest - 25th International Vacuum Nanoelectronics Conference, IVNC 2012-
dc.citation.titleTechnical Digest - 25th International Vacuum Nanoelectronics Conference, IVNC 2012-
dc.citation.startPage362-
dc.citation.endPage363-
dc.type.rimsART-
dc.type.docTypeConference Paper-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusArtificial life-
dc.subject.keywordPlusCarbon nanotubes-
dc.subject.keywordPlusEtching-
dc.subject.keywordPlusField emission-
dc.subject.keywordPlusNanoelectronics-
dc.subject.keywordPlusNanotubes-
dc.subject.keywordPlusPorous silicon-
dc.subject.keywordPlusSubstrates-
dc.subject.keywordPlusEmission current density-
dc.subject.keywordPlusField emission property-
dc.subject.keywordPlusIon etching-
dc.subject.keywordPlusPore channels-
dc.subject.keywordPlusSingle-walled carbon nanotube (SWNTs)-
dc.subject.keywordPlusThree-dimensional networks-
dc.subject.keywordPlusTop surface-
dc.subject.keywordPlusTurn-on field-
dc.subject.keywordPlusSingle-walled carbon nanotubes (SWCN)-
dc.subject.keywordAuthorcarbon nanotube-
dc.subject.keywordAuthorField emission-
dc.subject.keywordAuthorporous silicon-
dc.identifier.urlhttps://ieeexplore.ieee.org/document/6316970-
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