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Surface Structures and Thermal Desorption Behaviors of Cyclopentanethiol Self-Assembled Monolayers on Au(111)

Authors
Kang, HunguKim, YouyoungPark, TaesunPark, Joon B.Ito, EisukeHara, MasahikoNoh, Jaegeun
Issue Date
Apr-2011
Publisher
대한화학회
Keywords
Cyclopentanethiol; Self-assembled monolayers; Scanning tunneling microscopy; Thermal desorption spectroscopy; Structure
Citation
Bulletin of the Korean Chemical Society, v.32, no.4, pp 1253 - 1257
Pages
5
Indexed
SCI
SCIE
SCOPUS
KCI
Journal Title
Bulletin of the Korean Chemical Society
Volume
32
Number
4
Start Page
1253
End Page
1257
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/151314
DOI
10.5012/bkcs.2011.32.4.1253
ISSN
0253-2964
1229-5949
Abstract
The surface structures, adsorption conditions, and thermal desorption behaviors of cyclopentanethiol (CPT) self-assembled monolayers (SAMs) on Au(111) were investigated by scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), and thermal desorption spectroscopy (TDS). STM imaging revealed that although the adsorption of CPT on Au(111) at room temperature generates disordered SAMs, CPT molecules at 50 degrees C formed well-ordered SAMs with a (2 root 3 x root 5)R41 degrees packing structure. XPS measurements showed that CPT SAMs at room temperature were formed via chemical reactions between the sulfur atoms and gold surfaces. TDS measurements showed two dominant TD peaks for the decomposed fragments (C5H9+, m/e = 69) generated via C-S bond cleavage and the parent molecular species (C5H9SH+, m/e = 102) derived from a recombination of the chemisorbed thiolates and hydrogen atoms near 440 K. Interestingly, dimerization of sulfur atoms in n-alkanethiol SAMs usually occurs during thermal desorption and the same reaction did not happen for CPT SAMs, which may be due to the steric hindrance of cyclic rings of the CPT molecules. In this study, we demonstrated that the alicyclic ring of organic thiols strongly affected the surface structure and thermal desorption behavior of SAMs, thus providing a good method for controlling chemical and physical properties of organic thiol SAMs.
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