Novel device structure for phase change memory toward low-current operation
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Eunha | - |
dc.contributor.author | Kang, Nam Soo | - |
dc.contributor.author | Yang, Hyung-Jun | - |
dc.contributor.author | Sutou, Yuji | - |
dc.contributor.author | Song, Yun-Heub | - |
dc.date.accessioned | 2022-07-15T21:13:16Z | - |
dc.date.available | 2022-07-15T21:13:16Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2015-09 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/156493 | - |
dc.description.abstract | We present a novel device architecture for low set and reset currents in phase change random access memory (PCRAM). In this structure, the sidewall of phase-change film is contacted with the vertical heating layer. In particular, to realize a small contact area of under 50 nm(2) for low reset current, this structure includes stacked layers consisting of extremely thin phase change material (PCM) and conduction films, the fabrication method of which is proposed. We estimated set and reset currents for the proposed structure by the device simulation method. Here, we confirmed that a contact area of 30 nm(2) in this structure, where Ge2Sb2Te5 is used as PCM, provides a reset current of 13.5 mu A and a set current of 4 mu A, which are promising for the scaling down of PCM. Furthermore, it is confirmed that the thinner PCM in this structure provides less thermal disturbance to the neighboring cell. From the results, we expect this structure to be a promising candidate for a high-density nonvolatile memory architecture with PCM. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | Novel device structure for phase change memory toward low-current operation | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Song, Yun-Heub | - |
dc.identifier.doi | 10.7567/JJAP.54.094302 | - |
dc.identifier.scopusid | 2-s2.0-84941009301 | - |
dc.identifier.wosid | 000362024900032 | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS, v.54, no.9, pp.1 - 4 | - |
dc.relation.isPartOf | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 54 | - |
dc.citation.number | 9 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 4 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | ARRAY | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.identifier.url | https://iopscience.iop.org/article/10.7567/JJAP.54.094302 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.