Effect of the Si nanowire's diameter and doping profile on the electrical characteristics of gate-all-around twin Si-nanowire field-effect transistors
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Dong Hun | - |
dc.contributor.author | Kim, Tae Whan | - |
dc.date.accessioned | 2022-07-15T21:45:33Z | - |
dc.date.available | 2022-07-15T21:45:33Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2015-08 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/156666 | - |
dc.description.abstract | The effect of the Si nanowire's diameter and doping profile on the electrical characteristics of gate-all-around twin Si-nanowire field-effect transistors (TSNWFETs) was simulated by using the three-dimensional technology computer-aided design simulation tools of Sentaurus and taking into account quantum effects. While the switching and the short-channel immunity characteristics were improved with decreasing nanowire diameter, the threshold voltage and the total on-current for the TSNWFETs decreased, resulting in a deterioration of device performances. The swing characteristics for the TSNWFETs maintained almost the same behaviors regardless of the boron concentration variation in the nanowire. Gate-induced drain leakage (GIDL) of the TSNWFETs appeared at a high drain voltage, and the GIDL current increased with increasing boron concentration in the Si nanowires. The electrical characteristics of the TSNWFETs were improved by optimizing the diameter and the doping concentration of the Si nanowire to lower the GIDL and the off-state leakage current. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.title | Effect of the Si nanowire's diameter and doping profile on the electrical characteristics of gate-all-around twin Si-nanowire field-effect transistors | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Tae Whan | - |
dc.identifier.doi | 10.3938/jkps.67.502 | - |
dc.identifier.scopusid | 2-s2.0-84939451003 | - |
dc.identifier.wosid | 000359939600013 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.67, no.3, pp.502 - 506 | - |
dc.relation.isPartOf | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 67 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 502 | - |
dc.citation.endPage | 506 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART002018002 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordAuthor | Gate-all-around twin Si-nanowire field-effect transistors | - |
dc.subject.keywordAuthor | Electrical property | - |
dc.subject.keywordAuthor | Quantum effects | - |
dc.subject.keywordAuthor | Gate-induced drain leakage | - |
dc.identifier.url | https://link.springer.com/article/10.3938%2Fjkps.67.502 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.