Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
DC Field | Value | Language |
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dc.contributor.author | Jung, Hyunsoo | - |
dc.contributor.author | Jeon, Heeyoung | - |
dc.contributor.author | Choi, Hagyoung | - |
dc.contributor.author | Ham, Giyul | - |
dc.contributor.author | Shin, Seokyoon | - |
dc.contributor.author | Jeon, Hyeongtag | - |
dc.date.accessioned | 2022-07-16T06:13:50Z | - |
dc.date.available | 2022-07-16T06:13:50Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2014-02 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/160775 | - |
dc.description.abstract | Al2O3 films deposited by remote plasma atomic layer deposition have been used for thin film encapsulation of organic light emitting diode. In this study, a multi-density layer structure consisting of two Al2O3 layers with different densities are deposited with different deposition conditions of O-2 plasma reactant time. This structure improves moisture permeation barrier characteristics, as confirmed by a water vapor transmission rate (WVTR) test. The lowest WVTR of the multi-density layer structure was 4.7 x 10(-5) gm(-2) day(-1), which is one order of magnitude less than WVTR for the reference single-density Al2O3 layer. This improvement is attributed to the location mismatch of paths for atmospheric gases, such as O-2 and H2O, in the film due to different densities in the layers. This mechanism is analyzed by high resolution transmission electron microscopy, elastic recoil detection, and angle resolved X-ray photoelectron spectroscopy. These results confirmed that the multi-density layer structure exhibits very good characteristics as an encapsulation layer via location mismatch of paths for H2O and O-2 between the two layers. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Jeon, Hyeongtag | - |
dc.identifier.doi | 10.1063/1.4866001 | - |
dc.identifier.scopusid | 2-s2.0-84898959059 | - |
dc.identifier.wosid | 000332042000005 | - |
dc.identifier.bibliographicCitation | JOURNAL OF APPLIED PHYSICS, v.115, no.7, pp.1 - 8 | - |
dc.relation.isPartOf | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.title | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 115 | - |
dc.citation.number | 7 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 8 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | GAS-DIFFUSION BARRIERS | - |
dc.subject.keywordPlus | LIGHT-EMITTING-DIODES | - |
dc.subject.keywordPlus | POLYMERS | - |
dc.subject.keywordPlus | FILMS | - |
dc.identifier.url | https://aip.scitation.org/doi/10.1063/1.4866001 | - |
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