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Analysis of Electron Temperature in DC Ar/SF6 Plasma Using Cylindrical and Planar Probes
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Woo | - |
| dc.contributor.author | Cho, Soon-Gook | - |
| dc.contributor.author | Bae, Min-Keun | - |
| dc.contributor.author | Kim, Hyung-Jin | - |
| dc.contributor.author | Chung, Tae Hun | - |
| dc.contributor.author | Chung, Kyu-Sun | - |
| dc.date.accessioned | 2022-07-16T07:38:08Z | - |
| dc.date.available | 2022-07-16T07:38:08Z | - |
| dc.date.issued | 2013-11 | - |
| dc.identifier.issn | 0021-4922 | - |
| dc.identifier.issn | 1347-4065 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/161583 | - |
| dc.description.abstract | Electronegative plasmas are generated by adding SF6 gas to a background argon (Ar) DC plasma with parameters of n(0) = 1 x 10(10) cm(3) and T-e = 2 eV. The heating current of the thoriated filament was in the range of 20.5-21.5 A and the plasmas were generated under a discharge condition of 100 V/0.4 A. The amount of negative ions was controlled by adjusting the ratio of flow rate of SF6 = 0-10% to that of Ar. Plasma parameters were measured using cylindrical and planar electric probes. The behavior of electrons, which means the change in a parameter due to negative ion production, is characterized by measuring the floating and plasma potentials, and electron temperature. Electron temperature seems to increase and the potentials decrease with SF6 flow rate. | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | IOP Publishing Ltd | - |
| dc.title | Analysis of Electron Temperature in DC Ar/SF6 Plasma Using Cylindrical and Planar Probes | - |
| dc.type | Article | - |
| dc.publisher.location | 영국 | - |
| dc.identifier.doi | 10.7567/JJAP.52.11NC03 | - |
| dc.identifier.scopusid | 2-s2.0-84889077783 | - |
| dc.identifier.wosid | 000328492300020 | - |
| dc.identifier.bibliographicCitation | Japanese Journal of Applied Physics, v.52, no.11, pp 1 - 4 | - |
| dc.citation.title | Japanese Journal of Applied Physics | - |
| dc.citation.volume | 52 | - |
| dc.citation.number | 11 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 4 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | NEGATIVE-ION DENSITY | - |
| dc.subject.keywordPlus | PHOTODETACHMENT | - |
| dc.identifier.url | https://iopscience.iop.org/article/10.7567/JJAP.52.11NC03 | - |
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