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Effect of iron(III) nitrate concentration on tungsten chemical-mechanical-planarization performance
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lim, Jae-Hyung | - |
| dc.contributor.author | Park, Jin-Hyung | - |
| dc.contributor.author | Park, Jea-Gun | - |
| dc.date.accessioned | 2022-07-16T07:56:08Z | - |
| dc.date.available | 2022-07-16T07:56:08Z | - |
| dc.date.issued | 2013-10 | - |
| dc.identifier.issn | 0169-4332 | - |
| dc.identifier.issn | 1873-5584 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/161794 | - |
| dc.description.abstract | Investigating the catalytic effect of Fe(NO3)(3) on the performance of tungsten (W) chemical mechanical planarization in H2O2-based acidic slurries, we found that the trend of the polishing rate with increasing Fe(NO3)(3) concentration was divided into two regions. The polishing rate in region I (<0.10 wt%) increased rapidly because of the increase of the WO3 layer formed by the reaction of Fe(NO3)(3) and H2O2. The polishing rate in region II (>0.10 wt%), on the other hand, increased only slightly with increasing Fe(NO3)(3) concentration. We suggest the excess ferric ions in the slurry were rapidly supplied to the W surface. Consequently, the addition of Fe(NO3)(3) resulted in the rapid formation of the WO3 layer because of the decomposition of H2O2 into O-2 by Fe3+ ion, and polishing rate increased with the Fe(NO3)(3) concentration. This polishing trend was explained through the opposite trend of static etch rate, the confirmation of the surface morphology, the trend of the WO3 content on the W surface, and the trend of the corrosion potential and the corrosion current density. | - |
| dc.format.extent | 6 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier BV | - |
| dc.title | Effect of iron(III) nitrate concentration on tungsten chemical-mechanical-planarization performance | - |
| dc.type | Article | - |
| dc.publisher.location | 네델란드 | - |
| dc.identifier.doi | 10.1016/j.apsusc.2013.06.003 | - |
| dc.identifier.scopusid | 2-s2.0-84880944472 | - |
| dc.identifier.wosid | 000322314800076 | - |
| dc.identifier.bibliographicCitation | Applied Surface Science, v.282, pp 512 - 517 | - |
| dc.citation.title | Applied Surface Science | - |
| dc.citation.volume | 282 | - |
| dc.citation.startPage | 512 | - |
| dc.citation.endPage | 517 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Chemistry | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
| dc.subject.keywordPlus | MIXED OXIDIZERS | - |
| dc.subject.keywordPlus | CMP PROCESS | - |
| dc.subject.keywordPlus | THIN-FILMS | - |
| dc.subject.keywordPlus | BEHAVIOR | - |
| dc.subject.keywordPlus | SLURRIES | - |
| dc.subject.keywordPlus | REMOVAL | - |
| dc.subject.keywordAuthor | Tungsten | - |
| dc.subject.keywordAuthor | Chemical mechanical planarization | - |
| dc.subject.keywordAuthor | Oxidizer | - |
| dc.subject.keywordAuthor | Fe(NO3)(3) | - |
| dc.subject.keywordAuthor | Catalyst | - |
| dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0169433213011021?via%3Dihub | - |
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