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Electrical stability enhancement of the amorphous In-Ga-Zn-O thin film transistor by formation of Au nanoparticles on the back-channel surface
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Cho, Byungsu | - |
| dc.contributor.author | Lee, Jaesang | - |
| dc.contributor.author | Seo, Hyungtak | - |
| dc.contributor.author | Jeon, Hyeongtag | - |
| dc.date.accessioned | 2022-07-16T11:06:09Z | - |
| dc.date.available | 2022-07-16T11:06:09Z | - |
| dc.date.issued | 2013-03 | - |
| dc.identifier.issn | 0003-6951 | - |
| dc.identifier.issn | 1077-3118 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/163317 | - |
| dc.description.abstract | We demonstrate a significant improvement in various electrical instabilities of amorphous indium gallium zinc oxide (a-IGZO) thin film transistor (TFT) by implanting Au nanoparticles (NPs) on the a-IGZO back-channel. This TFT showed the enhanced stability of threshold voltage (V-th) under ambient humidity, illumination stress, and a-IGZO thickness variation tests. Application of back-channel Au NPs to a-IGZO TFT is regarded to control the surface potential, to lead reversible carrier trap/injection, and to increase incident UV light absorption by local surface plasmon. Au NPs are formed by e-beam evaporation, and therefore, this technique can be applicable to the TFT manufacturing process. | - |
| dc.format.extent | 5 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | American Institute of Physics | - |
| dc.title | Electrical stability enhancement of the amorphous In-Ga-Zn-O thin film transistor by formation of Au nanoparticles on the back-channel surface | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1063/1.4795536 | - |
| dc.identifier.scopusid | 2-s2.0-84875128557 | - |
| dc.identifier.wosid | 000316501200035 | - |
| dc.identifier.bibliographicCitation | Applied Physics Letters, v.102, no.10, pp 1 - 5 | - |
| dc.citation.title | Applied Physics Letters | - |
| dc.citation.volume | 102 | - |
| dc.citation.number | 10 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 5 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | Amorphous semiconductors | - |
| dc.subject.keywordPlus | Gold alloys | - |
| dc.subject.keywordPlus | Nanoparticles | - |
| dc.subject.keywordPlus | Thin film transistors | - |
| dc.subject.keywordPlus | Gold | - |
| dc.subject.keywordPlus | Amorphous-indium gallium zinc oxides | - |
| dc.subject.keywordPlus | E beam evaporation | - |
| dc.subject.keywordPlus | Electrical instability | - |
| dc.subject.keywordPlus | Electrical stability | - |
| dc.subject.keywordPlus | Enhanced stability | - |
| dc.subject.keywordPlus | Local surface plasmons | - |
| dc.subject.keywordPlus | Manufacturing process | - |
| dc.subject.keywordPlus | Thickness variation | - |
| dc.identifier.url | https://aip.scitation.org/doi/10.1063/1.4795536 | - |
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