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Fast Response Time Patterned Vertical Alignment Mode Using Double Step UV Exposure

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dc.contributor.authorKim, Youngsik-
dc.contributor.authorKim, Dong Ha-
dc.contributor.authorLee, You-Jin-
dc.contributor.authorYu, Chang Jae-
dc.contributor.authorKim, Jae Hoon-
dc.date.accessioned2022-07-16T11:26:23Z-
dc.date.available2022-07-16T11:26:23Z-
dc.date.created2021-05-13-
dc.date.issued2013-01-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/163562-
dc.description.abstractWe propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one. As a result, we can achieve not only the fast rising time and but also falling time.-
dc.language영어-
dc.language.isoen-
dc.publisherKorean Liquid Crystal Society, The Korean Information Display Society-
dc.titleFast Response Time Patterned Vertical Alignment Mode Using Double Step UV Exposure-
dc.typeArticle-
dc.contributor.affiliatedAuthorYu, Chang Jae-
dc.contributor.affiliatedAuthorKim, Jae Hoon-
dc.identifier.bibliographicCitationThe 15th Korea Liquid Crystal Conference (KLCC 2013), pp.47 - 49-
dc.relation.isPartOfThe 15th Korea Liquid Crystal Conference (KLCC 2013)-
dc.citation.titleThe 15th Korea Liquid Crystal Conference (KLCC 2013)-
dc.citation.startPage47-
dc.citation.endPage49-
dc.type.rimsART-
dc.type.docTypeProceeding-
dc.description.journalClass2-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassother-
dc.identifier.urlhttp://ddlab.hanyang.ac.kr/inner_image/publication/proceeding/274.pdf-
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