The estimation of dielectric constant of thick film using Vickers indentation
DC Field | Value | Language |
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dc.contributor.author | Kim, Hyeong-Jun | - |
dc.contributor.author | Kim, Kibum | - |
dc.contributor.author | Kim, Jongcheol | - |
dc.contributor.author | Yoon, Kyung-Han | - |
dc.contributor.author | Shin, Dongwook | - |
dc.date.accessioned | 2022-07-16T13:01:48Z | - |
dc.date.available | 2022-07-16T13:01:48Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2012-11 | - |
dc.identifier.issn | 1229-9162 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/164349 | - |
dc.description.abstract | The barrier rib on plasma display panel (PDP) is a typical 3D-patterned thick film with thickness of 120 pm and it is hard to measure its dielectric constant in this state of the product. Because the porosity of ceramic thick film influenced the mechanical and dielectric characteristics, it was expected that there was the relationship between two properties. Therefore, the correlation analysis between porosity, hardness and dielectric constant of the barrier rib was studied and the exponential curve between porosity and hardness, and the quadratic curve between porosity and dielectric constant were drawn. The dielectric constant was well related to hardness by K-100kHz = 0.5672 + 5.695 ln(Hv). The hardness was measured at five points on two real panels which sintered by two types of profiles and then dielectric constants and deviation were estimated by the above equation. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | KOREAN ASSOC CRYSTAL GROWTH, INC | - |
dc.title | The estimation of dielectric constant of thick film using Vickers indentation | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Shin, Dongwook | - |
dc.identifier.doi | 10.36410/jcpr.2012.13..241 | - |
dc.identifier.scopusid | 2-s2.0-84874201823 | - |
dc.identifier.wosid | 000313470700020 | - |
dc.identifier.bibliographicCitation | JOURNAL OF CERAMIC PROCESSING RESEARCH, v.13, pp.S241 - S245 | - |
dc.relation.isPartOf | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
dc.citation.title | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
dc.citation.volume | 13 | - |
dc.citation.startPage | S241 | - |
dc.citation.endPage | S245 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART002328737 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
dc.subject.keywordPlus | CERAMICS | - |
dc.subject.keywordPlus | POROSITY | - |
dc.subject.keywordPlus | SILICA | - |
dc.subject.keywordAuthor | Ceramic thick film | - |
dc.subject.keywordAuthor | Dielectric constant | - |
dc.subject.keywordAuthor | Hardness | - |
dc.subject.keywordAuthor | Porosity | - |
dc.identifier.url | https://www.kci.go.kr/kciportal/landing/article.kci?arti_id=ART002328737 | - |
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