Oxygen Vacancy Chain Formation in TiO2 under External Strain for Resistive Switching Memory
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yoo, Dong Su | - |
dc.contributor.author | Ahn, Kiyong | - |
dc.contributor.author | Cho, Sung Beom | - |
dc.contributor.author | Lee, Minho | - |
dc.contributor.author | Chung, Yong-Chae | - |
dc.date.accessioned | 2022-07-16T15:07:45Z | - |
dc.date.available | 2022-07-16T15:07:45Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2012-06 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/165404 | - |
dc.description.abstract | The electronic structure and vacancy formation energy of rutile TiO2 with ordered oxygen vacancies were calculated using the density functional theory with on-site Coulomb corrections between Ti 3d orbital and O 2p orbital (LDA+U-d+U-p). The calculated band gaps are about 3 eV, using LDA+U-d+U-p, and a hybrid functional proposed by Heyd-Scuseria-Ernzerhog. The ordered oxygen vacancies were introduced along the [001] direction within a 3x3x4 supercell of rutile TiO2-x that consisted of 72 Ti and 136 O atoms. Biaxial strain was induced in the rutile TiO2 along the x- and y-directions up to +/- 5%. The lowest formation energy of ordered oxygen vacancies was found in 5% compressive strain and deemed as a thermodynamically favorable structure. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | Oxygen Vacancy Chain Formation in TiO2 under External Strain for Resistive Switching Memory | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Chung, Yong-Chae | - |
dc.identifier.doi | 10.1143/JJAP.51.06FG14 | - |
dc.identifier.scopusid | 2-s2.0-84863314178 | - |
dc.identifier.wosid | 000306189800098 | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS, v.51, no.6, pp.1 - 5 | - |
dc.relation.isPartOf | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 51 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 5 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | TITANIUM-DIOXIDE | - |
dc.subject.keywordPlus | NIO FILMS | - |
dc.subject.keywordPlus | FUNCTIONALS | - |
dc.subject.keywordPlus | SUBSURFACE | - |
dc.subject.keywordPlus | RESISTANCE | - |
dc.subject.keywordPlus | ENERGY | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1143/JJAP.51.06FG14 | - |
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