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Bidirectional Two-Terminal Switching Device for Non-Volatile Random Access Memory

Authors
Kil, Gyu-HyunYang, Hyung-JunLee, Gae-HunLee, Seong-HyunSong, Yun-Heub
Issue Date
Apr-2012
Publisher
IOP Publishing Ltd
Citation
Japanese Journal of Applied Physics, v.51, no.4, pp 1 - 4
Pages
4
Indexed
SCI
SCIE
SCOPUS
Journal Title
Japanese Journal of Applied Physics
Volume
51
Number
4
Start Page
1
End Page
4
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/165928
DOI
10.1143/JJAP.51.04DJ02
ISSN
0021-4922
1347-4065
Abstract
A two-terminal N+/P/N+ Si junction device that can replace the conventional selective transistor was studied as a bilateral switching device for spin transfer torque magnetic random access memory (STT-MRAM), by three-dimensional device simulation. An N+/P/N+ junction structure with 30 x 30nm(2) area provides sufficient bidirectional current flow to write data by a drain-induced barrier lowering (DIBL) under a reverse bias at the N+/P (or P/N+) junction, and high current on/off ratio of 10(6), which is acceptable for STT-MRAM. In this work, critical parameters such as P-length, P doping, and N+ doping are investigated to elucidate the optimal parameter condition in view of write current and current on/off ratio.
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