Bidirectional Two-Terminal Switching Device for Non-Volatile Random Access Memory
- Authors
- Kil, Gyu-Hyun; Yang, Hyung-Jun; Lee, Gae-Hun; Lee, Seong-Hyun; Song, Yun-Heub
- Issue Date
- Apr-2012
- Publisher
- IOP Publishing Ltd
- Citation
- Japanese Journal of Applied Physics, v.51, no.4, pp 1 - 4
- Pages
- 4
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- Japanese Journal of Applied Physics
- Volume
- 51
- Number
- 4
- Start Page
- 1
- End Page
- 4
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/165928
- DOI
- 10.1143/JJAP.51.04DJ02
- ISSN
- 0021-4922
1347-4065
- Abstract
- A two-terminal N+/P/N+ Si junction device that can replace the conventional selective transistor was studied as a bilateral switching device for spin transfer torque magnetic random access memory (STT-MRAM), by three-dimensional device simulation. An N+/P/N+ junction structure with 30 x 30nm(2) area provides sufficient bidirectional current flow to write data by a drain-induced barrier lowering (DIBL) under a reverse bias at the N+/P (or P/N+) junction, and high current on/off ratio of 10(6), which is acceptable for STT-MRAM. In this work, critical parameters such as P-length, P doping, and N+ doping are investigated to elucidate the optimal parameter condition in view of write current and current on/off ratio.
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