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Patterned oxide semiconductor by electrohydrodynamic jet printing for transparent thin film transistors
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Sangkyu | - |
| dc.contributor.author | Kim, Jeonghyun | - |
| dc.contributor.author | Choi, Junghyun | - |
| dc.contributor.author | Park, Hyunjung | - |
| dc.contributor.author | Ha, Jaehwan | - |
| dc.contributor.author | Kim, Yongkwan | - |
| dc.contributor.author | Rogers, John A. | - |
| dc.contributor.author | Paik, Ungyu | - |
| dc.date.accessioned | 2022-07-16T16:22:48Z | - |
| dc.date.available | 2022-07-16T16:22:48Z | - |
| dc.date.issued | 2012-03 | - |
| dc.identifier.issn | 0003-6951 | - |
| dc.identifier.issn | 1077-3118 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/166157 | - |
| dc.description.abstract | This paper explores transport in transparent thin film transistors formed using a liquid precursor to indium zinc oxide, delivered to target substrates by electrohydrodynamic jet (e-jet) printing. Under optimized conditions, we observe field effect mobilities as high as 32 cm(2) V(-1)s(-1), with on/off current ratios of 10(3) and threshold voltages of 2 V. These results provide evidence that material manipulated in fine-jet, electric field induced liquid flows can yield semiconductor devices without any adverse effects of residual charge or unintentional doping. E-jet printing methods provide levels of resolution (similar to 1.5 mu m) that provide a path to printed transistors with small critical dimensions. | - |
| dc.format.extent | 5 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | American Institute of Physics | - |
| dc.title | Patterned oxide semiconductor by electrohydrodynamic jet printing for transparent thin film transistors | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1063/1.3691177 | - |
| dc.identifier.scopusid | 2-s2.0-84863361611 | - |
| dc.identifier.wosid | 000301655500037 | - |
| dc.identifier.bibliographicCitation | Applied Physics Letters, v.100, no.10, pp 1 - 5 | - |
| dc.citation.title | Applied Physics Letters | - |
| dc.citation.volume | 100 | - |
| dc.citation.number | 10 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 5 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | LOW-TEMPERATURE FABRICATION | - |
| dc.subject.keywordPlus | ELECTRONICS | - |
| dc.subject.keywordPlus | NANOSCALE | - |
| dc.identifier.url | https://aip.scitation.org/doi/10.1063/1.3691177 | - |
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